Metal Alloy High Purity Titanium Sputtering Target

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About Metal Alloy High Purity Titanium Sputtering Target:

Standard:
ASTM B265, ASME SB265, ASTM F67, ASTM F136, AMS 4902, AMS 4911

Properties:
Titanium sputtering target is made of titanium metal, which is recognized for its high strength-to-weight ratio. It is a strong metal with low density that is quite ductile (especially in an oxygen-free environment), lustrous, and metallic-white in color. The relatively high melting point (more than 1,650 °C or 3,000 °F) makes it useful as a refractory metal. It is paramagnetic and has fairly low electrical and thermal conductivity.

Application:
mainly used for integrated circuit, DRAMS and flat panel display application.

Payment & Transportation:
Metal Alloy High Purity Titanium Sputtering Target插图

Metal Alloy High Purity Titanium Sputtering Target Properties

Other NamesTitanium sputtering target
CAS No.N/A
Compound FormulaTi
Molecular WeightN/A
AppearanceN/A
Melting PointN/A
Solubility in waterN/A
DensityN/A
Purity99.6%
Sizecustomized
Boling pointN/A
Specific HeatN/A
Thermal ConductivityN/A
Thermal ExpansionN/A
Young’s ModulusN/A
Exact MassN/A
Monoisotopic MassN/A
  
  

Metal Alloy High Purity Titanium Sputtering Target Health & Safety Information

Safety WarningN/A
Hazard StatementsN/A
Flashing pointN/A
Hazard CodesN/A
Risk CodesN/A
Safety StatementsN/A
RTECS NumberN/A
Transport InformationN/A
WGK GermanyN/A
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